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High Purity Titanium Silicide Ti5Si3 Powder CAS 12067-57-1, 99% | Lemondedudroit

Titanium Silicide, Ti5Si3, has excellent characteristics. The silica has high melting points (2 403K), low density (4.32 G/cm3), high resistivity (50 –120mO*cm), high toughness (968 HV) and high strength at high temperatures.
Purity: 99%

Size of the particle: 5-10um


Titanium Silicide Ti5Si3 Puffer



It has high high-temperature stability and high-temperature strength. Following is the sintering procedure: Mix Si powder with Ti powder, heated to 1350 1450. Heat preservation. Once the furnace has cooled to room temperature, then the sintered materials are added to the anhydrousethanol. Finally, the sealed container is inserted into the high energy planetary ballmill, which uses AR gas to protect it.

Ti5Si3 powder

It was done by passing through a 130-mesh Sieve.

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Titanium Silicide Ti5Si3 Puffer


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Titanium Silicide Ti5Si3 Puffer


Titanium Silicide Ti5Si3 Pulver Product Performance:

Titanium Silicide, Ti5Si3, has excellent characteristics. It has high melting points (2403 K), low densities (4.3 g/cm3) low resistance (50 –120mO*cm), high toughness (968 V), and excellent temperature stability.

Technical Parameters of Titanium Silicide Powder Ti5Si3:

Name of the product MF Purity Size of the particle Molecular weight Density The color of the sky
Titanium Silicide Ti5Si3 99% 5-10um 323.59 4.39 g/cm3 black

Titanium silicicide Ti5Si3 powder: Chemical composition

Ti5Si3 Ti Si P S Si Mg Fe
99% 73.6% 26.1% 0.012% 0.07% 0.006% 0.001% 0.12%

It is simple.

Titanium Silicide Ti5Si3 Puffer


Ti5Si3 may be prepared in a number of ways. These include casting, powder-sintering and rapid solidification methods. Self-propagating combustion is another option. However, these techniques can be prone to pollution due to their complex processing technology and low yield.

1. The invention is about a method to prepare trisilicate Pentatitanium intermetallic compound paste in a batch. This process includes the following steps.

(1) Ti5Si3 was made by vacuum-sintering. It is composed of Si and Ti powders at a 3:5 molar ratio.

(2) Step 1: Place evenly-mixed Si powder and T powder into a vacuum furnace. Then, heat the oven to 1350-1450. Cool the furnace at room temperature.

(3) After preparing the sintered materials in step 2, anhydrousethanol was added to them and they were then placed into a tank. This sealed tank was placed in an AR gas-protected high-energy planetary mill and refined with the wet ballmill method.

(4) Ball milling slurry from Step 3 was vacuum dried, ground and powdered into Ti5Si3 by using a 130-mesh sieve.

2. This batch preparation method is for trisilicate intermetallic powder. It is described in Claim 1 as having the following characteristic: The vacuum degree in vacuum furnace (2) in said step (2) must be less than 1.0×10-2Pa.

3. Following the batch method for the preparation of trisilicate intermetallic compounds powder, as claimed in claim 1, these characteristics are: The temperature at 1350-1450 is reached at a rate of 20/min. It is then held at that temperature for between 3-5 hours.

4. In claim 1, it is stated that batch preparation methods of trisilicate-intermetallic compound powder are described. The rotational speed for the planetary ballmill in step (3) is 300 to 500 RPM. Ball grinding takes 24-48 hours.

This batch method is for the preparation of trisilicate Penta–titanium intermetallic compounds powder according to the following molar ratio: 3:5. The furnace heats up to 1350-1450. Heat preservation is used. After the mixture is heated, it is transferred to the vacuum tank. (The sealed tank is filled with AR gas.) Ti5Si3 was then ground using a 130 mesh sieve. This process eliminates many defects, such as the melting casting method or powder pressing sintering methods, rapid solidification technique and self spreading combustion method. These are difficult to clean up, have low yields, high processing technology, and can easily cause pollution. High purity, zero byproducts. The process can control the stoichiometric proportion of products.


Titanium Silicide Ti5Si3 Puffer


Ti5Si3 titanium silicide is used extensively in the production of MOS, MOSFET, and DRAM gates. Source/drain interconnects with ohmic contacts.

Packing and Shipping of Titanium Silicide Ti5Si3 Pulver:

There are many options for packing, which all depend on the amount of titanium silicide Si3 powder.

Packaging of Titanium Silicide Ti5Si3 Powder:

You can vacuum pack 100g, 500g, 1kg/bag or 25kg/barrel. Or as you request.

Powder shipping of Titanium Silicide Ti5Si3:

After receipt of payment, items may be sent out either by sea or air.

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Titanium Silicide Properties

Other Titles
Pentatitanium trisilicide


Compound Formula

Molecular Weight

Gray Black Powder

Melting Point

Boiling Point

4.39 g/cm3

Solubility of H2O

Exact Mass

Titanium Silicide Health & Safety Information

Signal word

Hazard Statements

Hazard Codes

Risk Codes

Safety statements

Transport Information

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