High Purity Titanium Silicide TiSi2 Powder CAS 12039-83-7, 99.5% | Lemondedudroit

The Titanium Silicide TiSi2 Pulver:


Large integrated circuits are rapidly developing (ULSI). As a result, equipment sizes and requirements have become smaller.

The wire width of the current semiconductor device is now less than 0.1mm. Therefore, it’s impossible to get a continuous conductor that has a low resistance.

For circuit metallization improvement or replacement, we need new materials and deposition methods.

Metal silicon with high conductivity, high temperature stability, and metal silica has been gaining increasing attention. This is compatible to the microelectronic manufacturing process.

Disilicide for Titanium

Has low resistance and high temperatures. Good stability.

Commonly studied

metal silicide

This includes

TiSi2

Nisi, Cosi2, WSi2, TaSi2, TASi2, MOSi2) silicide TiSi2 has the following characteristics: High conductivity and selectivity. In the integrated circuit device this is also possible.

TiSi2 titanium silicide

This is used widely to create a MOS (metal oxide semiconductor), a MOSFET (metal oxide semiconductor field-effect transistor), and a DRAM (dynamic random access memory). It can be gated, leakaged, or mutually contact with ohm.

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titanium disilicide price

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TiSi2 Titanium Silicide Powder

In bulk.

Titanium Silicide TiSi2 Pulver Characteristics:


This titanium silicide TiSi2 Powder (CAS 1203983-7) has a high melt point, high corrosion resistance. high oxidation resistance.

Technical Parameters of Titanium Siicide TiSi2 Pulp:

Name of the product	MF	Purity	Particle Size	Melting Point	Density	The color of the sky
Titanium silicide	TiSi2	99%	5-10um	1620	4.0 g/cm3	black

Titanium Silicide TiSi2 Pulp:

TiSi2	Ti	Si	C	P	Fe	S
>99%	46.32%	52.5%	0.02%	0.02%	0.19%	0.01%

Molybdenum siicide:


MoSi2


Is powder produced?


You can make di silicide by reacting titanium with hydride or silicon.

Ti +2 Si – Tisi2

Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.

Reacting with titanium tetrachloride can be used to produce silane, dicloronilane and silicon.

TiCl4 + TiH4 – Tisi2+ 4 HCl+ 2 H2

TiCl4 + 2 SiH2Cl2+ 2 H2 — Tisi2 +8 HCL

TiCl4+3 Si – Tisi2+ SiCL4

Applicaciones


Molybdenum Silicide


MoSi2


Powder:


In the semiconductor industry, titanium silicide is utilized. The sheet resistance of the local transistor connections is reduced by growing it using salicide technology. It is used most often in the C54 Phase of microelectronics.

1. Silicide Titanide’s melting point and low cost are high. The chemical properties of Silicide Titanide make it a versatile material with many applications in microelectronics.

2. Aerospace Industry, Ship Submarine Manufacturing, Medical, Jewelery Manufacturing.

Packing and Shipping Titanium Silicide Powder TiSi2 Powder


There are many options for packing, which depend on the amount of titanium silicide TiSi2 in your powder.

Packaging of TiSi2 titanium silicide powder


You can vacuum pack 100g, 500g, 1kg/bag or 25kg/barrel. Or as you request.

Powder shipping of Titanium silicide TiSi2


Could be sent by sea or air as soon as possible after receipt of payment.

Luoyang Tongrun Nano Technology Co. Ltd.

High-quality products are what you want

TiSi2 powder

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