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Preparation and application of titanium nitride thin films

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1. TiN thin films: Preparation methods As film preparation technology improved, TiN films were more accessible at home as well as abroad. Also, there was more variety in the methods of preparation. Today, there has been great progress. TiN films are prepared using two methods: physical vapor deposition or chemical vapor desposition.
1.1 physical vapor deposition (PVD)
1.1.1 Evaporation by electron beam
Because of their inability to combine with substrate and lack of repeatability, TiN thin film prepared using vacuum coating are not often used abroad and at home. At the moment, electron beam is the most commonly used method for vacuum coating at home and overseas. An electron beam is used to heat a substance to evaporate. The characteristics include high energy densities, higher thermal efficiency and less thermal conduction, radiation and heat loss, and can be used to reduce reaction between container and plating materials. TiN coating purity can be improved.

1.1.2 Sputtering coat method
For TiN thin films prepared by magnetron, there are two major techniques: rf magnetron (using ceramic TiN targets) and dc magneticron. Non-equilibrium magnetron and reactive sputtering were recently developed. Due to its special advantages, the reactive sputtering technique was used for TiN film preparation. Non-equilibrium magnetron is a popular method of sputtering at home as well as abroad. TiN films prepared by magnetronsputtering have the following advantages: high sputtering rates, low substrate temperature rises, good membrane base adhesions, device stability, easy control and operation. It does have some limitations, however, like a lower deposition rate or lower efficiency. This is not good for decreasing deposition cost. Magnetron sputtering is limited to fields that need higher TiN coatings such as optics or microelectronics.
1.1.3 Arc ion plating
TiN coating has evolved from a relatively new technology to be used worldwide in the production of cemented carbide and high speed steel. Ion plating technology has seen great advancements in the last few years. The most common technology used for ion-plating is now arc ion, or multi-arc. Ion plating has become the sole production method of titanium nitride. The following factors affect the performance and structure of TiN coated by arc Ion plating: arc current; substrate temperature; partial pressure of nitrogen; cavity pressure.
1.1.4 Plasma Immersion Ion Implant Technology
Conrad was the first to invent the plasma immersion ion implant (PIII), a method that prepares TiN films using TiN technology. He found that PIII technology is capable of simultaneously injecting and processing a number of workpieces. The equipment and process of making TiN films is simple. This can reduce production costs and have a high application value. Plasma immersion Ion Injection /k is a method of deposition in which the plasma elements are vertically injected onto all surfaces using strong electric field forces.
1.2 chemical vapor deposition (CVD)
1.2.1 general chemical vapor deposition (CVD) method
A new method for making inorganic materials is the CVD method. The technology used to make TiN films using the CVD method has been very well developed internationally. Sandwick (a Swedish firm) used CVD technology in the early 1960s to deposit TiN coatings onto cemented carbide tools. This technology was rapidly commercialized due to its low cost and significantly longer life span. The chemical vapor deposition method of N coating has many advantages over PVD. It is fast in film formation, easy crystallization and smooth deposition. Unfortunately, this device can only be used in very specific environments, such as extreme temperatures or high vacuum.
1.2.2 plasma enhanced chemical vapor deposition
In the preparation and application of Ti since the 1990s the pulsed DC PCVD coating technique has advanced greatly. The coating has already been tested in various molds and tools with promising results. The PCVD method for coating is rapidly evolving at home as well as abroad. This plasma chemical vapor deposited method has the excellent wrapping ability of CVD. It has better wrapping properties than CVD, with fewer pinholes, internal stress, and microcrack. Three types of PCVD power supply are available at the moment: dc rf, and microwave.
1.2.3 laser chemical vapor deposition
It is very appealing to make thin TiN films using laser chemicalvapor deposition. Most importantly, it is capable of producing high quality TiN films. TiN films made by this method have many applications. In fact, LCVD technology has been rapidly developed in recent years. Laser chemicalvapor deposition is the chemical vapor-deposition technique for thin films that uses a laser beam. The laser beam’s energy density is high and it heats quickly, so the process can be greatly expedited. This CVD has many benefits over conventional CVD. It is low in temperature, high damage and fine processing. Laser chemical vapor deposition technology in the country has now reached an international advanced stage.

2. TiN film application
2.1 The mechanical processing industry
TiN film reduces adhesion to cutting edge materials and can improve cutting force. It also improves the quality of workpieces and increases the tool’s durability. TiN films are used extensively in coating low-speed and high-speed metal cutting, as well wood cutting tools. TiN films are worn parts with excellent wear resistance, particularly because they have low gelling. These factors, along with the fact that it is easy to apply wear to many systems such as the automobile engine piston sealing circle, various bearings and gears such as the: In addition, TiN are widely used in molding tool coating technology such as the sheet molding tool coats for the automotive industry.
Medical Industry 2.2
TiN films are non-toxic and light in weight. They also have excellent biocompatibility. Titanium nitride films are also excellent biocompatibility film options. Nelea et al. greatly improved mechanical properties and adhesion for hydroxyapatite films (HA), a common medical material.
Spaceflight 2.3
Coat IF –MS2 with TiN. It is possible to improve the wear resistance for sulfur dimolybdate grease. The TIN film is covered with if-ms2. The TIN film is coated on if-ms2.
Application of solar energy: 2.4
Research into TiN thin films as a stabilizing layer for solar absorbing layers in extreme temperatures began back in 1984. Recent research has shown that (Tia1N coating was also recommended as solar selective absorbing layers and control windows. This is due to the excellent resistance to high temperatures of (TiaAI)N coating. TiN, TiA1N and TiA1N are used in the solar energy field. The idea is being tested and explored.

Luoyang Tech Co. Ltd. (TiN Manufacturer) has over 12 years’ experience in chemical product research and development. We can help you find high-quality TiN. Please contact us to send an enquiry.