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With the development of the times, the application of zinc nitride is also constantly improving

Zinc Nitride: Overview
Zn3N2 gray crystal is the chemical formula for zinc nitride. It dissolves easily in hydrochloric Acid. The zinc nitride quickly becomes ammonia and zinc hydroxide in cold water. This is made by reacting zinc powder with ammonia at 500 to600°C, or heating and decomposing the amino zinc.


This is

Zinc Nitride


Useful for making zinc nitride-based films

Zinc oxide (Zn3N2) is a zinc nitride with unique optical and electrical properties. It does not matter whether zinc oxide is a semiconductor with an energy band gap or one that has an indirect band. This dispute in the semiconductor industry has been constant. The band gap can be affected greatly by differences between academia and industry in terms of growth conditions and methods. To prepare zinc nitride films, techniques such as magnetic sputtering and chemical vapor desposition can be used.

However, most zinc nitride films have poor stability. Additionally, different optical and electrical properties are obtained from zinc oxide films. A simple, reproducible and repeatable preparation process with high crystallization is needed. This is the method for preparing zinc nitride films. To prepare the zinc-nitride films, the preparation process uses the atomic layers deposition technique. This method can be used to precisely manage the band gap. The membrane prepared has an excellent structure with excellent performance.

Here are some technical solutions:

The following steps can be used to make a zinc-nitride film:

(1) Put the substrate in the reaction room of the equipment for atomic layer formation.

(2) Add the zinc-containing pre-cursor source to the reaction chamber.

(3) Allow the nitrogen-containing pre-cursor source to be deposited in the reaction chamber of an atomic layer deposition machine. Then, use plasma to ionize it. Once the nitrogen atoms have been ionized, they are partially deposited onto the substrate, forming a nitrogen/zinc covalent bond. The nitrogen precursor is then ionized. This nitrogen precursor is then sent to the atomic-layer deposition equipment for reactions. The partially deposited nitrogen atoms of the precursor nitrogen-containing source will be found in the cavity. Forge a zinc-zinc covalent bond on the substrate.

Continue to repeat steps (2) through (3) in order to build the zinc oxide film layer by layer.

Simple and repeatable, the method yields high-quality crystals. Once the nitrogen source is added to the atomic layer, it’s controlled by the plasma. The chamber temperature and vacuum degrees, as well as the cycle period and plasma conditions can then be adjusted. You can adjust the band gap for the prepared zinc-nitride film. The invention is capable of producing high-quality zinc oxide films that can be adjusted to meet different optical and electrical application needs.

2. Use this to create a touchscreen cover or touch screen cover film

The demand for touch screen interaction is increasing with the technological advancements and development of smart devices. This solves the issues of low coating yield, low production cost and poor efficiency. If the product is combined with a liquid-crystal display, it’s easy for bubbles to be produced and can not achieve a perfect fit. You can provide touch screen covers and touch screen films made of zinc oxide.

A new type touch screen cover film is made with zinc nitride. This film acts as a functional layer over the black surface. It is a touch-screen cover film that includes a Zinc nitride(Zn3N2) and a Silicon nitride (4Si3N4) films. This film’s thickness ranges from 10-50nm. Zinc nitride films with a thickness greater than 50 nm will have a decrease in adhesion. Films that are less than 10 or more nm thick will not transmit light. A zinc nitride-based film is functionally a layer on a dark film. It has an absorption strength of visible light and a black appearance. This touch screen cover film comprises a zinc (Zn3N2) and silicon (Si3N4) films, as well as a protective film. In sequence, the thicknesses for the zinc nitride and silicon film are respectively 10 and 50 nm. The protective film can be a standard plastic protection film. This touch screen cover includes the touch screen substrate as well as the touchscreen cover film. The zinc nitride layer of the touch screen covering film connects to the glass substrate.

(aka. Technology Co. Ltd. (aka. We have developed several materials. The powder of zinc nitride, Zn3N2, manufactured by our company is high in purity and has a fine particle size. To get the products you need, send an email to us or click here

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